There are 4 manufacturers.
High-tech equipment, services and technical support in Semiconductor industry,MEMS, Biomedical, Nanotechnology,Solar,LEDs etc.. Located in Santa Clara, the heart of Silicon Valley, Allwin21 has been providing unique technical support, high quality equipment and fast supplied spare parts worldwide. We have maintained a global presence that has grown and expanded. into the major high-tech manufacturing areas of the world. Allwin21 Corp. provide Rapid Thermal Process, Plasma Asher Stripper Descum, Plasma Etch, Reactive ion etching (RIE), PECVD, Inductively coupled plasma (ICP), Metrology & Inspection, Electrical Test and PCM Software, Wafer Probers, Sputtering and Evaporator System
Cleaning Systems - Cleaning systems for a variety of substrate sizes, up to twenty three inches (23") on the diagonal/diameter that provide for uniform application of High Pressure and/or Megasonic de-ionized H2O dispensed. Plumbed for submicron application, having all Teflon lines and stainless or Teflon valves. Optional brushes, with surfactant dispense are available, as are low pressure dispenses of surfactant and/or chemistries for one step cleaning. Rapid acceleration and excellent exhaust along with N2 dry assist provide for short and thorough drying cycle. To thoroughly eliminate potential electrostatic buildup an N2 ionizer unit and antistatic materials are available. Automated Cassette-to-Cassette Double Sided Systems >> Manual Load Double Sided Systems >> Manual Load Single Sided Systems>> - H2O Reionizers - Systems for re-ionizing of de-ionized H2O with CO2. Re-ionization eliminates deleterious effects caused, if left untreated, the two most significant of which are localized surface ionization and primary and secondary damage associated with static discharge. - Spin Coaters - - Developers -
Systems for coating substrates with liquid films (i.e. photoresists, polyamides, spin-on-glass). Specially configured for coating uniformity and low consumption of liquid films.
Systems for developing positive photoresist liquid film coating on substrates. Provides uniform control of develop parameters and provides controlled termination of develop cycle and efficient rinse.